Plating is an electrolytic process, and the factors of the plating power supply will definitely have a direct impact on the plating process, therefore, the plating power supply has an important position in the plating process.
Author: Anna
Plating is an electrolytic process, and the factors of the plating power supply will definitely have a direct impact on the plating process, therefore, the plating power supply has an important position in the plating process.
I. Switching power supply
Switching power supply has both the waveform smoothness of silicon rectifier advantages of high-frequency switching power supply and silicon controlled rectifier regulating the advantages of convenience, high current efficiency and minimum volume, thousands of amps to tens of thousands of amps of high-power switching power supply has entered the practical stage of production. Switching power supply whose frequency has reached audio, through filtering to achieve low ripple output is more simple and easy to use. And current stabilization, voltage stabilization and other functions are more easily achieved. Therefore, switching power supply is the direction of future development.
II. Basic types of rectifiers
Silicon rectifier: silicon rectifier has a long history of use, mature technology, is currently the mainstream rectifier products. Various rectifier circuits are obtained by pulsating DC, not pure DC. In order to compare the amount of pulsating components, the ripple coefficient is generally used to indicate that the smaller the value, the less AC components, the closer to pure DC. Various rectifier circuits have different ripple coefficients. The order from largest to smallest is: three-phase half-wave rectification, three-phase full-wave bridge rectification or six-phase double inverse star rectification with balanced reactor. Special plating SCR uses to change the SCR tube conduction angle to adjust the output average DC size of the ordinary SCR rectifier, the output of the SCR tube is intermittent pulse wave, its ripple coefficient of the conduction angle control, the output ripple coefficient is greater than the ordinary silicon rectifier circuit.
III. The influence of plating power supply on plating process
DC power supply waveform has a prominent impact on the quality of electroplating of all kinds of plating processes, chromium plating is one of the most affected by the power supply waveform. Metal plating must use low ripple DC power supply, otherwise the brightness range is narrow, and the plating layer is easy to blossom, gray. In the use of high-efficiency hard chrome plating additives, produce micro-crack chromium layer, when the output ripple is too large, the cracks are not fine and unevenly distributed, and the required number of cracks is not achieved.
IV. Pulse power supply
Pulse power supply is mainly controlled by embedded single-chip computers, etc. Therefore, in addition to achieving pulse output, it generally has a variety of control functions.
In summary for electroplating, in addition to hard chrome plating using silicon controlled rectifier compared to high-frequency power supply, some stability. Other plating is generally used in high-frequency pulse power supply, chromium plating is also a lot of high-frequency pulse at this stage, because the conversion rate of silicon controlled is too low, power consumption is too large, the calculation is not cost-effective. There are some high quality nickel plating, the general output also need to use filtering, ordinary conventional power supply only the output with filtering, and even some even the input is not with filtering.
The above is the application of electroplating power supply and low ripple coefficient rectifier power supply in the electroplating industry, I hope that electroplating colleagues in the selection of rectifier power supply, solve the plating fault, improve the quality of plating help.